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AS ISO 17560-2006
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Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
standard by Standards Australia, 10/20/2006
Description
Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
Product Details
- Edition:
- 1st
- Published:
- 10/20/2006
- ISBN(s):
- 0733777872
- Number of Pages:
- 10
- File Size:
- 1 file , 770 KB
- Product Code(s):
- 10090409, 10090404, 10090419
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